The IC industry is headed toward a new era of scaling–and uncertainty–as chip makers race to develop the key building blocks for the next-generation transistor: high-k dielectrics and metal gates.

Researchers unveil a roadmap for 2D transistor gate stack design, marking a key step toward ultra-efficient chips that could replace silicon technology. For decades, silicon-based CMOS technology has ...

Applied Materials Inc. today released its DPN (decoupled plasma nitration) chamber that uses plasma to fabricate transistor gate dielectric structures in next-generation chips. The company is trying ...